Ion-beam spray system PP201

PURPOSE AND SCOPE

The invention is intended for the deposition of thin films by ion - beam sputtering. The developed source due to the controlled flow of charged particles on the treated surface is of interest both for experimental studies of plasma flows interaction with the surface of solids, and directly for the use in various ion - beam processes. The results of the work can be implemented in scientific institutions of physical and technical profile and directly at the enterprises  that produce modern products of science

STATE OF INTELLECTUAL PROPERTY PROTECTION

The development is protected by a patent of the USA and Ukraine

MARKET DEMAND

The development is in demand in the market of Ukraine, Russia, USA

ESSENCE OF THE DEVELOPMENT

The device is a self - contained ion - beam spray system. It can be attached or placed in a vacuum chamber where the pads are located. The device consists of one or more targets that are sprayed, and a combined magnetic field that controls the flow of charged particles to the workpiece. The target to be sprayed may be under electric or floating potential. The position of the target can be adjusted relative to the ion beam

THE DEVELOPMENT READINESS STATUS

The complete package of technical documentation has been developed. The pilot copy of the source is manufactured, debugged and examined